Optical Coatings and Gratings

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• ALİ SAMET SARKIN
• NAZMİ EKREN
• ŞAFAK SAĞLAM

We report experimental and theoretical analysis of the plasmonic resonances of Al nanoparticles and nanorods. Ordered nanoparticle arrays with well-defined shapes and narrow size distributions are fabricated on quartz substrates over large areas using extreme ultraviolet interference lithography. The structures, which…

Plasmonic nanohole arrays have received significant attention, as they have highly advantageous optical properties for ultrasensitive and label-free biosensing applications. Currently, most of these subwavelength periodic apertures are mainly implemented on transparent materials, which results in multiple spectrally c…

• ARİF ENGİN ÇETİN

Plasmonic nanohole arrays have received significant attention, as they have highly advantageous optical properties for ultrasensitive and label-free biosensing applications. Currently, most of these subwavelength periodic apertures are mainly implemented on transparent materials, which results in multiple spectrally c…

• YASA EKŞİOĞLU ÖZOK

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We analyze the influence of near-field coupling on the formation of collective plasmon modes in a multilayer metallic nanowire array. It is shown that the spectral interference between super- and subradiant normal modes results in characteristic line shape modifications which are directly controlled by the spacing as…

The authors investigate the multiple confined modes of GaAs L3 photonic crystal air-bridge cavities, using single layers of InAs quantum dots as active internal light sources. Theoretical results for the energies, quality factors, and emission polarizations of the first five modes are compared to experimental data for…

• MEHMET ŞAHİN

Extreme ultraviolet (EUV, λ=13 nm) lithography is considered to be the most likely technology to follow ultraviolet (optical) lithography. One of the challenging aspects is the development of suitable resist materials and processes. This development requires the ability to produce high-resolution patterns. Until now,…

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• NUMAN GÖZÜBENLİ

Sub-50 nm lines, holes, and posts have been patterned photolithographically using near-field embedded-amplitude masks and an exposing wavelength of 220 nm generated by an arc-lamp source. Interference in the optical near field is utilized to produce the fine patterns. In some cases, the feature sizes on the mask are m…

• HAMİDE KAVAK

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• HÜSEYİN DERİN

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