SYNTHESIS OF P(N-ISOPROPYL ACRYLAMIDE- HYDROXYPROPYL METHACRYLATE) THERMO RESPONSIVE COPOLYMER FILMs BY INITIATED CHEMICAL VAPOR DEPOSITION METHOD

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This study illustrates the deposition of thermo responsive p(N-isopropyl acrylamide-hydroxypropyl methacrylate) p(NIPAAm-HPMA) copolymer thin films by initiated chemical vapor deposition (iCVD) method using tert-butyl peroxide (TBPO) as the initiator. Copolymers were deposited at three different HPMA flow rates and the effects of NIPAAm/HPMA flow rate ratio on the deposition rate, structure and responsive properties of the as-deposited films were investigated. The highest deposition rate of 50 nm/min was observed for the copolymer deposited using lowest NIPAAm/HPMA monomer ratio studied. The deposition rate showed a significant increase with decreasing NIPAAm/HPMA flow ratio. Results of FTIR and XPS spectroscopy analyses revealed a significant preservation of structural retention in iCVD p(NIPAAm-HPMA) thermo-responsive films. Lower critical solution temperatures (LCST) of p(NIPAAm-HPMA) films were determined by carrying out a temperature-dependent contact angle analysis. Accordingly, it was shown that LCST was varied between 19 and 23 oC, which was observed to be dependent on the NIPAAm/HPMA monomer ratio. That LCST range is considerably below the literature- reported values for pNIPAAM, which makes the as-deposited copolymer suitable for applications that require thermos-responsive properties at lower temperatures.